Developments in Surface Contamination and Cleaning

Contaminant Removal and Monitoring

Author: Rajiv Kohli

Publisher: William Andrew

ISBN: 143777881X

Category: Science

Page: 240

View: 3090

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In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources. Feature: Comprehensive coverage of innovations in surface contamination and cleaning Benefit: One-stop series where a wide range of readers will be sure to find a solution to their cleaning problem, saving the time involved in consulting a range of disparate sources. Feature: Written by established experts in the contamination and cleaning field Benefit: Provides an authoritative resource Feature: Each chapter is a comprehensive review of the state of the art. Benefit: Can be relied on to provide insight, clarity and real expertise on up-to-the-minute innovations. Feature: Case studies included Benefit: Case studies help the reader see theory applied to the solution of real-world practical cleaning and contamination problems.

Developments in Surface Contamination and Cleaning - Vol 2

Particle Deposition, Control and Removal

Author: Rajiv Kohli,Kashmiri L. Mittal

Publisher: William Andrew

ISBN: 9781437778304

Category: Science

Page: 312

View: 4992

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Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced models Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants In-depth coverage of ultrasonic cleaning Contamination and cleaning issues at the nanoscale Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal "Kash" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. · Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination · Covers contamination and cleaning issues at the nanoscale · Includes an in-depth look at ultrasonic cleaning

Developments in Surface Contamination and Cleaning, Volume 4

Detection, Characterization, and Analysis of Contaminants

Author: Rajiv Kohli,Kashmiri L. Mittal

Publisher: William Andrew

ISBN: 1437778844

Category: Science

Page: 352

View: 8908

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In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources. Comprehensive coverage of innovations in surface contamination and cleaning Written by established experts in the contamination and cleaning field Each chapter is a comprehensive review of the state of the art Case studies included

Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques

Author: Rajiv Kohli,K.L. Mittal

Publisher: Elsevier

ISBN: 0128155787

Category: Technology & Engineering

Page: 830

View: 5052

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Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques, Volume Eleven, part of the Developments in Surface Contamination and Cleaning series, provides a guide to recent advances in the application of cleaning techniques for the removal of surface contamination in various industries, such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. The material in this new edition compiles cleaning applications into one easy reference that has been fully updated to incorporate new applications and techniques. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. Presents the latest reviewed technical information on precision cleaning applications as written by established experts in the field Provides a single source on the applications of innovative precision cleaning techniques for a wide variety of industries Serves as a guide to the selection of precision cleaning techniques for specific applications

Particle Adhesion and Removal

Author: K. L. Mittal,Ravi Jaiswal

Publisher: John Wiley & Sons

ISBN: 1118831551

Category: Technology & Engineering

Page: 576

View: 3116

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The book provides a comprehensive and easily accessiblereference source covering all important aspects of particleadhesion and removal. The core objective is to cover bothfundamental and applied aspects of particle adhesion and removalwith emphasis on recent developments. Among the topics to be covered include: 1. Fundamentals of surface forces in particle adhesion andremoval. 2. Mechanisms of particle adhesion and removal. 3. Experimental methods (e.g. AFM, SFA,SFM,IFM, etc.) tounderstand particle-particle and particle-substrateinteractions. 4. Mechanics of adhesion of micro- and nanoscaleparticles. 5. Various factors affecting particle adhesion to a variety ofsubstrates. 6. Surface modification techniques to modulate particleadhesion. 7. Various cleaning methods (both wet & dry) for particleremoval. 8. Relevance of particle adhesion in a host of technologies rangingfrom simple to ultra-sophisticated.

Developments in Surface Contamination and Cleaning, Volume 7

Cleanliness Validation and Verification

Author: Rajiv Kohli,Kashmiri L. Mittal

Publisher: William Andrew

ISBN: 0323311458

Category: Technology & Engineering

Page: 206

View: 4124

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As device sizes in the semiconductor industries are shrinking, they become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not as effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. The chapters in this Volume address the sources of surface contaminants and various methods for their collection and characterization, as well as methods for cleanliness validation. Regulatory aspects of cleaning are also covered. The collection of topics in this book is unique and complements other volumes in this series. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control, these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Includes new regulatory aspects

Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10

Author: Takeshi Hattori

Publisher: The Electrochemical Society

ISBN: 156677568X

Category: Semiconductor device

Page: 481

View: 6632

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This issue covers topics related to the removal of contaminants from and conditioning of Si (SOI), SiC, Ge, SiGe, and III-V semiconductor surfaces; cleaning media, including non-aqueous cleaning methods and tools; front- and back-end cleaning operations; integrated cleaning; cleaning of MEMS; photomasks (reticles); porous low-k dielectrics; post-CMP cleaning; wafer bevel cleaning and polishing; characterization, evaluation, and monitoring of cleaning; correlation with device performance as well as cleaning of equipment and storage and handling hardware. The hardcover edition includes a bonus CD-ROM of Cleaning Technology in Semiconductor Device Manufacturing 1989?2007: Proceedings from the ECS Semiconductor Cleaning Symposia 1?10. This bonus material is not available with the PDF edition.

Gasturbinen Handbuch

Author: Meherwan P. Boyce

Publisher: Springer-Verlag

ISBN: 3642598412

Category: Science

Page: 593

View: 5361

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Dieses amerikanische Standardwerk wurde vom Übersetzer angepaßt auf die deutschen Verhältnisse. Es bietet wertvolle Informationen für Installation, Betrieb und Wartung, technische Details der Auslegung, Kennzahlen und vieles mehr.

Handbook of Optics, Third Edition Volume II: Design, Fabrication and Testing, Sources and Detectors, Radiometry and Photometry

Author: Michael Bass,Casimer DeCusatis,Jay Enoch,Vasudevan Lakshminarayanan,Guifang Li,Carolyn MacDonald,Virendra Mahajan,Eric Van Stryland

Publisher: McGraw Hill Professional

ISBN: 0071629270

Category: Technology & Engineering

Page: 1264

View: 3952

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The most comprehensive and up-to-date optics resource available Prepared under the auspices of the Optical Society of America, the five carefully architected and cross-referenced volumes of the Handbook of Optics, Third Edition, contain everything a student, scientist, or engineer requires to actively work in the field. From the design of complex optical systems to world-class research and development methods, this definitive publication provides unparalleled access to the fundamentals of the discipline and its greatest minds. Individual chapters are written by the world's most renowned experts who explain, illustrate, and solve the entire field of optics. Each volume contains a complete chapter listing for the entire Handbook, extensive chapter glossaries, and a wealth of references. This pioneering work offers unprecedented coverage of optics data, techniques, and applications. Volume II covers design, fabrications, testing, sources, detectors, radiometry, and photometry.